Aluminum Nitride Substrate

Aluminum Nitride Substrate

Aluminum Nitride (AlN) substrate is a ceramic material widely used in the electronics industry. It is renowned for its superior thermal conductivity, high electrical insulating properties, and outstanding chemical stability. AlN substrates have a unique combination of properties that make them appropriate for demanding electronic and optoelectronic applications.

Aluminium nitride substrates have the following key characteristics:

Thermal Conductivity

Aluminum nitride is one of the materials with the highest thermal conductivity in ceramics, which makes it the perfect choice for applications requiring efficient heat dissipation. It has thermal conductivity comparable to copper, allowing for effective thermal management in electronic equipment.

Electrical Insulation

AlN substrates have exceptional electrical insulating properties, including high dielectric strength and low electrical conductivity. This allows them for uses in high-power electronics and high-frequency devices, where electrical isolation and insulation are crucial.

Chemical Stability

Aluminium nitride has low reactivity with a wide range of chemicals and gases, is chemically stable, and oxidation-resistant. Due to its stability, it can be used in harsh environments and applications involving corrosive substances.

Low Coefficient of Thermal Expansion (CTE)

AlN substrates possess a low coefficient of thermal expansion, exhibiting minimal dimensional changes in response to temperature fluctuations. This feature contributes to the reduction of thermal stress and the risk of cracking in electronic assemblies.

High Frequency and RF Performance

Aluminium nitride is well-suited for high-frequency applications due to its low dielectric loss and high thermal conductivity. AlN substrates are frequently used in RF/microwave components like power amplifiers, filters, and high-speed integrated circuits.

 

Standard Sizes and Thicknesses of AlN Substrates

The following shows the standard sizes and thicknesses of aluminum nitride substrates available:

Aluminum Nitride Substrate

Customized Aluminum Nitride Substrates

An aluminum nitride (AlN) substrate can be made specifically according to the given application requirements to customize its size, shape, thickness, and surface characteristics. AlN substrate can be processed using machining techniques such as laser cutting, drilling, and scribing. Based on different applications, surface treatment techniques such as polishing, chemical etching, and plasma cleaning can be used to improve the substrate's surface smoothness, cleanliness, or adhesion.

 

If needed, the AlN substrate can be metallized or patterned. This involves employing methods like Direct Bonded Copper (DBC), Direct Plated Copper (DPC), Thin Film Metallization and Thick Film Metallization to deposit metal layers (such as gold, silver, or copper) onto particular areas of the substrate.

 

High Power and High Thermal Conductivity Ceramic Substrate-IGBT Aluminum Nitride Heat Sink

Aluminum Nitride Substrate

Lead Time of AlN Substrates

For the substrates in stock, they are usually shipped within 7 working days. For the customized order, it will take 2-3 weeks.

 

Cross-Industries Uses

Applications and industries covered by the versatility of aluminum nitride substrates are numerous:

Optical electronic

AlN substrates are the basis of high-power LEDs and laser diodes because of their effective heat dissipation properties.

Communications

They are the foundation of RF/microwave components that allow dependable signal processing and high-speed data transfer, such power amplifiers and filters.

Implementations of Energy

The foundation of power modules for electric cars, renewable energy systems, and effective power conversion devices is AlN substrates.

Medical Instruments

Their contributions are to medical imaging equipment and ultrasonic transducers, where dependability and accuracy are essential.

Aerospace and Defense

AlN substrates offer electrical insulation and thermal management under demanding conditions to support radar systems, avionics, and satellite communications.

Features of substrates made of aluminum nitride

First-rate thermal management characteristics

With their very high thermal conductivity, our aluminum nitride substrates can rapidly and effectively transfer heat from electronic components to the outside world, lowering operating temperatures and enhancing the dependability and performance of the device.

Great qualities of electrical insulation

High resistivity and low dielectric loss of aluminum nitride substrates guarantee that electromagnetic interference will not impact applications in high-frequency circuits and make them perfect electrical insulators.

Complementing coefficients of thermal expansion

Because of the thermal expansion coefficient of our substrates, which is comparable to that of semiconductor materials like silicon, electronic packaging is less stressed and devices are more stable and reliable over time.

Services for flexible customisation

Since we are aware that every client has individual requirements, we offer specialized services that include substrate size, thickness, shape, and specific function design to suit various application scenarios.

Great performance materials

High-purity raw materials and sophisticated production methods are used to create aluminum nitride substrates that are ideal for high-power and high-temperature settings.

Technology of fine processing

To fulfill the requirements of high-precision applications, we can do high-precision surface treatment with a surface roughness of Ra=0.02μm or less. We are experts in fine processing technologies, including mirror processing.

Vigorous quality control

We use rigorous quality control procedures all through the production process to make sure that every aluminum nitride substrate satisfies the highest requirements and obtains several international certifications.

Capability of quick delivery

Our logistics network and production system are effective enough to meet customer demands fast, reduce delivery times, and guarantee timely advancement of customer projects.

Optoelectronic Applications

AlN substrates are used in optoelectronic devices including ultraviolet (UV) LEDs, laser diodes, and high-power optical equipment. It is appropriate for these applications due to its high thermal conductivity and optical transparency in the UV range.

Semiconductor Manufacturing

Aluminum nitride substrates are capable of being processed using standard semiconductor manufacturing methods like photolithography, etching, and metallization. This enables integration with other semiconductor materials and techniques.

Electronic Applications

Aluminum nitride substrates are available in a variety of dimensions, thicknesses, and surface finishes to satisfy the needs of specific applications. They are commonly utilized in the manufacture of power modules, electronic packages, heat sinks, integrated circuit substrates, and high-performance electronic devices.

 

Overall, aluminum nitride substrates provide excellent heat management, electrical insulation, and chemical stability, making them a preferred choice for numerous advanced electronic and optoelectronic applications.

Material Data Sheet of Aluminum Nitride

 

Thermal Coeffecient Expansion of Aluminum Nitride Substrate

 

Thermal Conductivity of Aluminum Nitride Substrate

 

Aluminum nitride substrates offer superior thermal conductivity, making them ideal for thermal management and heat dissipation. In addition, AlN ceramic has outstanding electrical insulating properties and high dielectric strength, making it suitable for use in a wide range of electronic devices.

 

How to Select Between AlN and Si3N4 Substrates

The choice between aluminum nitride (AlN) and silicon nitride (Si3N4) substrates is determined by a number of factors, including the specific application requirements and the characteristics of each material. Here are some points to take into account when you decide:

Thermal Conductivity

When compared to Si3N4, AlN has a higher thermal conductivity. AlN may be a preferable option if your application calls for superior thermal management and heat dissipation.

Electrical Insulation

Si3N4 and AlN are both excellent electrical insulators. However, because AlN has a higher dielectric strength than Si3N4, it is better suited for applications requiring higher voltage isolation.

Thermal Expansion

When compared to AlN, Si3N4 has a lower coefficient of thermal expansion (CTE). Si3N4 may be a more favorable choice if your application involves temperature cycling or calls for compatibility with other materials with low CTE.

Mechanical Strength

Si3N4 typically demonstrates greater mechanical strength and toughness than AlN. If your application requires resistance to mechanical stress or impact, Si3N4 may be a better choice.

Chemical Compatibility

AlN and Si3N4 are both chemically stable and resistant to a wide range of chemicals. Si3N4 is slightly more resistant to acidic environments, whereas AlN may function better in alkaline environments. When making a decision, take into account the specific chemical environment of your application.

Optoelectronic Applications

Si3N4 has greater optical transparency than AlN, particularly in the visible light spectrum. Si3N4 may be preferable if your application involves optical or optoelectronic components.

Aluminum Nitride Substrate
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